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A revolutionary light stabilizer system for polyolefins and other resins

Author
ARNABOLDI, Paolo1 ; DAVIS, Leonard2 ; SAMUELS, Sari-Beth; ZENNER, John M; VULIC, Ivan1
[1] Cytec Industries BV, Nelchrutistrasse 16, 8304 Wallisellen, Switzerland
[2] Cytec Industries Inc., 5 Garret Mountain Plaza, West Patterson, NJ 07424, United States
Conference title
ADDCON 2001
Conference name
Addcon World Conference (Berlin 2001-10)
Source

Polymers & polymer composites. 2002, Vol 10, Num 1, pp 93-97 ; ref : 15 ref

ISSN
0967-3911
Scientific domain
Polymers, paint and wood industries
Publisher
Rapra Technology, Shrewsbury
Publication country
United Kingdom
Document type
Conference Paper
Language
English
Keyword (fr)
Absorbant UV Additif Antioxydant Ethylène basse densité linéaire polymère Ethylène haute densité polymère Etude expérimentale Evaluation performance Moulage injection Pipéridine dérivé Propriété mécanique Propène polymère Stabilisant
Keyword (en)
Light stabiliser Additive Antioxidant Linear low density ethylene polymer High density ethylene polymer Experimental study Performance evaluation Injection molding Piperidine derivatives Mechanical properties Propylene polymer Stabilizer agent
Keyword (es)
Absorbente UV Aditivo Antioxidante Etileno baja densidad lineal polimero Etileno alta densidad polímero Estudio experimental Evaluación prestación Moldeo por inyección Piperidina derivado Propiedad mecánica Propeno polímero Estabilizante
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A03 Compounding ingredients / 001D10A03C Stabilizers (antioxydants, antiozonants, etc.)

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
13518291

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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