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Quantitative spectroscopy of substitutional nitrogen in GaAs1-xNx epitaxial layers by local vibrational mode absorption

Author
ALT, Hans Christian1 ; GOMENIUK, Yuri1 ; EBBINGHAUS, Gerhard2 ; RAMAKRISHNAN, Arun2 ; RIECHERT, Henning2
[1] Engineering Physics Department, FHM-Munich University of Applied Sciences, Postfach 20 01 13, 80001 München, Germany
[2] Infineon Technologies, Otto-Hahn-Ring 6, 81730 München, Germany
Source

Semiconductor science and technology. 2003, Vol 18, Num 4, pp 303-306, 4 p ; ref : 24 ref

CODEN
SSTEET
ISSN
0268-1242
Scientific domain
Electronics; Optics; Condensed state physics
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Arsenic Nitrure Composé binaire Couche mince Couche épitaxique Diffraction RX Epaisseur Epitaxie jet moléculaire Etude expérimentale Gallium nitrure Mode localisé Mode vibration Méthode MOCVD Semiconducteur III-V Spectre IR Spectre SIMS Spectre absorption Transformation Fourier As Ga n GaAs1-xNx Composé minéral
Keyword (en)
Arsenic Nitrides Binary compounds Thin films Epitaxial layers XRD Thickness Molecular beam epitaxy Experimental study Gallium nitrides Localized modes Vibrational modes MOCVD III-V semiconductors Infrared spectra Secondary ion mass spectra Absorption spectra Fourier transformation Inorganic compounds
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H40 Visible and ultraviolet spectra / 001B70H40F Semiconductors

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy

Pacs
7840F Semiconductors

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Pacs
8115H Molecular, atomic, ion, and chemical beam epitaxy

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
14638994

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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