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Microfluidic etching driven by capillary forces for rapid prototyping of gold structures

Author
STARK, R. W1 ; STALDER, M. Sakai1 ; STEMMER, A1
[1] Nanotechnology Group, Swiss Federal Institute of Technology Zurich, ETH Center CLA, 8092 Zurich, Switzerland
Conference title
Proceedings of the 28th International Conference on Micro- and Nano-Engineering, September 16-19, 2002, Lugano, Switzerland
Conference name
MNE 2002 International Conference on Micro- and Nano-Engineering (28 ; Lugano 2002-09-16)
Author (monograph)
BRUGGER, J (Editor); GOBRECHT, J (Editor); ROTHUIZEN, H (Editor); STAUFER, U (Editor); VETTIGER, P (Editor)
Source

Microelectronic engineering. 2003, Vol 67-68, pp 229-236, 8 p ; ref : 19 ref

CODEN
MIENEF
ISSN
0167-9317
Scientific domain
Electronics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
Microfluidic etching Rapid prototyping Soft lithography
Keyword (fr)
Chimie surface Couche autoassemblée Couche épaisse Fabrication microélectronique Formation motif Gravure Lithographie Masquage Microfluidique Prototypage rapide
Keyword (en)
Surface chemistry Self-assembled layer Thick film Microelectronic fabrication Patterning Engraving Lithography Masking Microfluidics Rapid prototyping
Keyword (es)
Capa autoensamblada Capa espesa Fabricación microeléctrica Formacíon motivo Grabado Litografía Enmascaramiento Prototipificación rápida
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
14862654

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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