Entwicklung eines Präparationsverfahrens für multikristalline Silizium-Wafer
- Other title
- Developing a preparation technique for multicrystalline silicon wafers (en)
- Author
- SCHABERGER-ZIMMERMANN, E1 ; SCHWEIZER, S2 ; APEL, M2
[1] Giesserei-Institut der RWTH Aachen, Intzestrasse 5, 52072 Aachen, Germany
[2] ACCESS e.V., Intzestrasse 5, 52072 Aachen, Germany - Source
Praktische Metallographie. = Practical Metallography. 2003, Vol 40, Num 9, pp 443-453, 11 p ; ref : 3 ref
- CODEN
- PMTLA5
- ISSN
- 0032-678X
- Scientific domain
- Metallurgy, welding
- Publisher
- Hanser, München
- Publication country
- Germany
- Document type
- Article
- Language
- English; German
- Keyword (fr)
- Attaque chimique Etude expérimentale Microstructure Métallographie Pastille électronique Polycristal Préparation surface Préparation échantillon Silicium
- Keyword (en)
- Chemical etching Experimental study Microstructure Metallography Wafers Polycrystals Surface preparation Sample preparation Silicon
- Keyword (es)
- Ataque químico Preparación superficie
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A16 Electron, ion, and scanning probe microscopy
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 15136498
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1515/pm-2003-400904 
https://dx.doi.org/10.1515/pm-2003-400904
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