Investigations of the interface stability in HfO2-metal electrodes
- Author
- FILLOT, F1 2 ; CHENEVIER, B2 ; GUILLAUMOT, B5 ; PASSEMARD, G5 ; MAITREJEAN, S1 ; AUDIER, M2 ; CHAUDOUËT, P2 ; BOCHU, B2 ; SENATEUR, J. P2 ; PISCH, A3 ; MOURIER, T1 ; MONCHOIX, H4
[1] CEA-LETI-DTS-STME-LDCM, 38054 Grenoble, France
[2] LMGP-UMR 5628 CNRS-ENSPG, 38402 St. Martin d'Hères, France
[3] LTPCM, INPG, 38402 St. Martin d'Hères, France
[4] Applied Materials, 38246 Meylan, France
[5] STMicroelectronics, 38926 Crolles, France - Conference title
- Materials for Advanced Metallization, MAM 2003: Proceedings of the European Workshop on Materials for Advanced Metallization 2003, La Londe Les Maures, France, March 9-12, 2003
- Conference name
- European Workshop on Materials for Advanced Metallization 2003 (La Londes Les Maures 2003-03-09)
- Author (monograph)
- THOMAS, Olivier (Editor)1 ; DALLAPORTA, Hervé (Editor)2 ; GAS, Patrick (Editor)3
[1] TECSEN, CNRS, Université d'Aix-Marseille III, 13397 Marseille, France
[2] GPEC-Univ. Aix-Marseille II, France
[3] Laboratoire Matériaux et Microélectrique de Provence - CNRS, Faculté des Sciences Saint-Jérôme, 13397 Marseille, France - Source
Microelectronic engineering. 2003, Vol 70, Num 2-4, pp 384-391, 8 p ; ref : 8 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Electrodes Interfaces Thermal stability Thermodynamic considerations X-Ray reflectometry
- Keyword (fr)
- Contact métal oxyde Couche mince Décomposition fonction Effet température Electrode Hafnium oxyde Microstructure Modèle thermodynamique Propriété interface Rugosité Réflectométrie Stabilité thermique Température recuit Hf O HfO2
- Keyword (en)
- Metal oxide contact Thin film Function decomposition Temperature effect Electrodes Hafnium oxide Microstructure Thermodynamic model Interface properties Roughness Reflectometry Thermal stability Annealing temperature
- Keyword (es)
- Contacto metal óxido Capa fina Descomposición función Efecto temperatura Electrodo Hafnio óxido Microestructura Modelo termodinámico Propiedad interfase Rugosidad Reflectometría Estabilidad térmica Temperatura recocido
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F01 Interfaces
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 15266318
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1016/S0167-9317(03)00428-3 
https://dx.doi.org/10.1016/S0167-9317(03)00428-3
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/S0167-9317(03)00428-3\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:9:\"\u0000*\u0000jtitle\";s:27:\"Microelectronic engineering\";s:9:\"\u0000*\u0000stitle\";s:18:\"Microelectron. eng\";s:7:\"\u0000*\u0000date\";s:4:\"2003\";s:9:\"\u0000*\u0000volume\";s:2:\"70\";s:8:\"\u0000*\u0000issue\";s:3:\"2-4\";s:8:\"\u0000*\u0000spage\";s:3:\"384\";s:8:\"\u0000*\u0000epage\";s:3:\"391\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0167-9317\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"FILLOT\";s:10:\"\u0000*\u0000aufirst\";s:1:\"F\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:11:{i:0;s:12:\"CHENEVIER, B\";i:1;s:13:\"GUILLAUMOT, B\";i:2;s:12:\"PASSEMARD, G\";i:3;s:13:\"MAITREJEAN, S\";i:4;s:9:\"AUDIER, M\";i:5;s:13:\"CHAUDOU\u00cbT, P\";i:6;s:8:\"BOCHU, B\";i:7;s:14:\"SENATEUR, J. P\";i:8;s:8:\"PISCH, A\";i:9;s:10:\"MOURIER, T\";i:10;s:11:\"MONCHOIX, H\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MIENEF\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:176:\"Materials for Advanced Metallization, MAM 2003: Proceedings of the European Workshop on Materials for Advanced Metallization 2003, La Londe Les Maures, France, March 9-12, 2003\";s:8:\"\u0000*\u0000title\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:16:\"Elsevier Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/S0167-9317(03)00428-3\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:9:\"\u0000*\u0000jtitle\";s:27:\"Microelectronic engineering\";s:9:\"\u0000*\u0000stitle\";s:18:\"Microelectron. eng\";s:7:\"\u0000*\u0000date\";s:4:\"2003\";s:9:\"\u0000*\u0000volume\";s:2:\"70\";s:8:\"\u0000*\u0000issue\";s:3:\"2-4\";s:8:\"\u0000*\u0000spage\";s:3:\"384\";s:8:\"\u0000*\u0000epage\";s:3:\"391\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0167-9317\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"FILLOT\";s:10:\"\u0000*\u0000aufirst\";s:1:\"F\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:11:{i:0;s:12:\"CHENEVIER, B\";i:1;s:13:\"GUILLAUMOT, B\";i:2;s:12:\"PASSEMARD, G\";i:3;s:13:\"MAITREJEAN, S\";i:4;s:9:\"AUDIER, M\";i:5;s:13:\"CHAUDOU\u00cbT, P\";i:6;s:8:\"BOCHU, B\";i:7;s:14:\"SENATEUR, J. P\";i:8;s:8:\"PISCH, A\";i:9;s:10:\"MOURIER, T\";i:10;s:11:\"MONCHOIX, H\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MIENEF\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:176:\"Materials for Advanced Metallization, MAM 2003: Proceedings of the European Workshop on Materials for Advanced Metallization 2003, La Londe Les Maures, France, March 9-12, 2003\";s:8:\"\u0000*\u0000title\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:16:\"Elsevier Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/S0167-9317(03)00428-3\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/S0167-9317(03)00428-3\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:9:\"\u0000*\u0000jtitle\";s:27:\"Microelectronic engineering\";s:9:\"\u0000*\u0000stitle\";s:18:\"Microelectron. eng\";s:7:\"\u0000*\u0000date\";s:4:\"2003\";s:9:\"\u0000*\u0000volume\";s:2:\"70\";s:8:\"\u0000*\u0000issue\";s:3:\"2-4\";s:8:\"\u0000*\u0000spage\";s:3:\"384\";s:8:\"\u0000*\u0000epage\";s:3:\"391\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0167-9317\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"FILLOT\";s:10:\"\u0000*\u0000aufirst\";s:1:\"F\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:11:{i:0;s:12:\"CHENEVIER, B\";i:1;s:13:\"GUILLAUMOT, B\";i:2;s:12:\"PASSEMARD, G\";i:3;s:13:\"MAITREJEAN, S\";i:4;s:9:\"AUDIER, M\";i:5;s:13:\"CHAUDOU\u00cbT, P\";i:6;s:8:\"BOCHU, B\";i:7;s:14:\"SENATEUR, J. P\";i:8;s:8:\"PISCH, A\";i:9;s:10:\"MOURIER, T\";i:10;s:11:\"MONCHOIX, H\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MIENEF\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:176:\"Materials for Advanced Metallization, MAM 2003: Proceedings of the European Workshop on Materials for Advanced Metallization 2003, La Londe Les Maures, France, March 9-12, 2003\";s:8:\"\u0000*\u0000title\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:16:\"Elsevier Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/S0167-9317(03)00428-3\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:9:\"\u0000*\u0000jtitle\";s:27:\"Microelectronic engineering\";s:9:\"\u0000*\u0000stitle\";s:18:\"Microelectron. eng\";s:7:\"\u0000*\u0000date\";s:4:\"2003\";s:9:\"\u0000*\u0000volume\";s:2:\"70\";s:8:\"\u0000*\u0000issue\";s:3:\"2-4\";s:8:\"\u0000*\u0000spage\";s:3:\"384\";s:8:\"\u0000*\u0000epage\";s:3:\"391\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0167-9317\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"FILLOT\";s:10:\"\u0000*\u0000aufirst\";s:1:\"F\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:11:{i:0;s:12:\"CHENEVIER, B\";i:1;s:13:\"GUILLAUMOT, B\";i:2;s:12:\"PASSEMARD, G\";i:3;s:13:\"MAITREJEAN, S\";i:4;s:9:\"AUDIER, M\";i:5;s:13:\"CHAUDOU\u00cbT, P\";i:6;s:8:\"BOCHU, B\";i:7;s:14:\"SENATEUR, J. P\";i:8;s:8:\"PISCH, A\";i:9;s:10:\"MOURIER, T\";i:10;s:11:\"MONCHOIX, H\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MIENEF\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:176:\"Materials for Advanced Metallization, MAM 2003: Proceedings of the European Workshop on Materials for Advanced Metallization 2003, La Londe Les Maures, France, March 9-12, 2003\";s:8:\"\u0000*\u0000title\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:16:\"Elsevier Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/S0167-9317(03)00428-3\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:9:\"\u0000*\u0000jtitle\";s:27:\"Microelectronic engineering\";s:9:\"\u0000*\u0000stitle\";s:18:\"Microelectron. eng\";s:7:\"\u0000*\u0000date\";s:4:\"2003\";s:9:\"\u0000*\u0000volume\";s:2:\"70\";s:8:\"\u0000*\u0000issue\";s:3:\"2-4\";s:8:\"\u0000*\u0000spage\";s:3:\"384\";s:8:\"\u0000*\u0000epage\";s:3:\"391\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0167-9317\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"FILLOT\";s:10:\"\u0000*\u0000aufirst\";s:1:\"F\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:11:{i:0;s:12:\"CHENEVIER, B\";i:1;s:13:\"GUILLAUMOT, B\";i:2;s:12:\"PASSEMARD, G\";i:3;s:13:\"MAITREJEAN, S\";i:4;s:9:\"AUDIER, M\";i:5;s:13:\"CHAUDOU\u00cbT, P\";i:6;s:8:\"BOCHU, B\";i:7;s:14:\"SENATEUR, J. P\";i:8;s:8:\"PISCH, A\";i:9;s:10:\"MOURIER, T\";i:10;s:11:\"MONCHOIX, H\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MIENEF\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:176:\"Materials for Advanced Metallization, MAM 2003: Proceedings of the European Workshop on Materials for Advanced Metallization 2003, La Londe Les Maures, France, March 9-12, 2003\";s:8:\"\u0000*\u0000title\";s:66:\"Investigations of the interface stability in HfO2-metal electrodes\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:16:\"Elsevier Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
