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IR study of exclusion-accumulation effects enhanced by the geometrical factor

Author
MALYUTENKO, V. K1 ; TESLENKO, G. I1 ; VAINBERG, V. V1 ; PIOTROWSKI, T2 ; PULTORAK, J2
[1] Institute of Semiconductor Physics, Kiev 28, Ukraine
[2] Institute of Electron Technology, 02-668 Warszawa, Poland
Source

Semiconductor science and technology. 2000, Vol 15, Num 11, pp 1054-1060 ; ref : 7 ref

CODEN
SSTEET
ISSN
0268-1242
Scientific domain
Electronics; Optics; Condensed state physics
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Contact ohmique Contact électrique Densité porteur charge Distribution concentration Etude expérimentale Etude théorique Facteur géométrique Imagerie IR Jonction p p+ Rayonnement IR
Keyword (en)
Ohmic contacts Electric contacts Carrier density Concentration distribution Experimental study Theoretical study Geometrical factor Infrared imaging p p+ junction Infrared radiation
Keyword (es)
Distribución concentración Factor geométrico Unión p p+
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C40 Electronic transport in interface structures / 001B70C40C Contact resistance, contact potential

Pacs
7340C Contact resistance, contact potential

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
1535752

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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