Advanced FIB mask repair technology for 100nm/ArF lithography (2)
- Author
- HAGIWARA, Ryoji1 ; YASAKA, Anto1 ; MATSUDA, Osamu1 ; OKABE, Mamoru1 ; SHINOHARA, Shoji1 ; HASUDA, Masakatsu1 ; ADACHI, Tatsuya1 ; MORIKAWA, Yasutaka2 ; NISHIGUCHI, Masaharu2 ; SATO, Yasushi2 ; HAYASHI, Naoya2 ; OZAWA, Toshiya3 ; AITA, Kazuo1 ; TANAKA, Yoshihiro3 ; YOSHIOKA, Nobuyuki3 ; TAKAOKA, Osamu1 ; KOYAMA, Yoshihiro1 ; KOZAKAI, Tomokazu1 ; DOI, Toshio1 ; MURAMATSU, Masashi1 ; SUZUKI, Katsumi1 ; SUGIYAMA, Yasuhiko1
[1] Seiko Instruments, Inc. 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
[2] Dai Nippon Printing Co., Ltd., 2-2-1 Fukuoka, Kamifukuoka, Saitama, 356-8507, Japan
[3] Semiconductor Leading Edge Technologies, Inc. 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan - Conference title
- Photomask and next-generation lithography mask technology X (Yokohama, 16-18 April 2003)
- Conference name
- Photomask and next-generation lithography mask technology. Conference (10 ; Yokohama 2003-04-16)
- Author (monograph)
- Tanabe, Hiroyoshi (Editor)
International Society for Optical Engineering, Bellingham WA, United States (Organiser of meeting) - Source
SPIE proceedings series. 2003, pp 510-519, 10 p ; ref : 3 ref
- ISBN
- 0-8194-4996-2
- Scientific domain
- Electronics; Optics; Physics; Telecommunications
- Publisher
- SPIE, Bellingham WA
- Publication country
- International
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Endommagement Essai Evaluation performance Fabrication microélectronique Formation image Imageur Lithographie Masque Microscopie force atomique Pastille électronique Photolithographie Procédé fabrication Répétabilité Scanneur
- Keyword (en)
- Damaging Test Performance evaluation Microelectronic fabrication Imaging Imager Lithography Mask Atomic force microscopy Wafer Photolithography Manufacturing process Repeatability Scanner
- Keyword (es)
- Deterioración Ensayo Evaluación prestación Fabricación microeléctrica Formación imagen Imager Litografía Máscara Microscopía fuerza atómica Pastilla electrónica Fotolitografía Procedimiento fabricación Repetibilidad Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 15851223
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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