Supercritical fluid immersion deposition: a new process for selective deposition of metal films on silicon substrates
- Author
- YE, Xiang R1 2 ; WAI, Chien M1 ; YUEHE LIN2 ; YOUNG, James S2 ; ENGELHARD, Mark H2
[1] Departtrent of Chemistry, University of Idaho, Moscow, Idaho 83844-2343, United States
[2] Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland WA 99352, United States - Source
Surface & coatings technology. 2005, Vol 190, Num 1, pp 25-31, 7 p ; ref : 57 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- Copper Immersion deposition Palladium silicide Palladium Silicon substrates Supercritical CO2
- Keyword (fr)
- Carbone dioxyde Cuivre Dépôt immersion Palladium siliciure Procédé dépôt Traitement surface
- Keyword (en)
- Carbon dioxide Copper Dip coating Palladium silicides Deposition process Surface treatments
- Keyword (es)
- Procedimiento revestimiento
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A90 Other topics in materials science
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16603327
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.surfcoat.2004.06.023 
https://dx.doi.org/10.1016/j.surfcoat.2004.06.023
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