Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition
- Author
- BESSERGENEV, V. G1 ; PEREIRA, R. J. F1 ; MATEUS, M. C1 ; KHMELINSKII, I. V1 ; VASCONCELOS, D. A1 ; NICULA, R2 ; BURKEL, E2 ; BOTELHO DO REGO, A. M3 ; SAPRYKIN, A. I4
[1] Universidade do Algarve, FCT, Campus de Gambelas, 8005-139 Faro, Portugal
[2] University of Rostock, FB Physik, August-Bebel-Str. 55, 18055 Rostock, Germany
[3] Centro de Química-Física Molecular, Complexe Interdisciplinar, IST, 1049-001 Lisboa, Portugal
[4] Institute of Inorganic Chemistry, Russian Academy of Sciences, Lavrentiev Av. 3, 630090 Novosibirsk, Russian Federation - Source
Thin solid films. 2006, Vol 503, Num 1-2, pp 29-39, 11 p ; ref : 45 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- Russian
- Author keyword
- CVD Photocatalysis Thin films Titanium dioxide
- Keyword (fr)
- Activité catalytique Chromatographie Composition chimique Composition surface Couche mince Diagramme poudre Diffraction RX Dépôt chimique phase vapeur Incidence rasante Ionisation Microscopie force atomique Morphologie surface Photocatalyse Propriété physique Précurseur Rayonnement synchrotron Spectre photoélectron RX Spectrométrie masse 6110N 6855N 8115G 8265
- Keyword (en)
- Catalyst activity Chromatography Chemical composition Surface composition Thin film Powder pattern X ray diffraction Chemical vapor deposition Grazing incidence Ionization Atomic force microscopy Surface morphology Photocatalysis Physical properties Precursor Synchrotron radiation X-ray photoelectron spectra Mass spectrometry
- Keyword (es)
- Actividad catalítica Cromatografía Composición química Capa fina Diagrama polvo Difracción RX Depósito químico fase vapor Incidencia rasante Ionización Microscopía fuerza atómica Fotocatálisis Propiedad física Precursor Radiación sincrotrón Espectrometría masa
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A10 X-ray diffraction and scattering / 001B60A10N Single-crystal and powder diffraction
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55N Composition and phase identification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01I Surface physical chemistry / 001C01I01 General, apparatus
- Discipline
- General chemistry and physical chemistry Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 17606342
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2005.10.046 
https://dx.doi.org/10.1016/j.tsf.2005.10.046
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