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Anomalous roughness evolution of rubrene thin films observed in real time during growth

Author
KOWARIK, S1 2 ; GERLACH, A1 2 ; SELLNER, S2 ; SCHREIBER, F1 2 ; PFLAUM, J3 ; CAVALCANTI, L4 ; KONOVALOV, O4
[1] Physical and Theoretical Chemistry, Oxford University, South Parks Road, Oxford, OX1 3QZ, United Kingdom
[2] Institut für Angewandte Physik-Vniversität, Tübingen, Auf der Morgenstelle 10, 72076 Tübingen, Germany
[3] 3. Physikalisches Institut, Universität Stuttgart, Pfaffenwaldring 57, 70550 Stuttgart, Germany
[4] European Synchrotron Radiation Facility, 6, rue Jules Horowitz-B.P. 220, 38043, Grenoble, France
Source

PCCP. Physical chemistry chemical physics (Print). 2006, Vol 8, Num 15, pp 1834-1836, 3 p ; ref : 13 ref

ISSN
1463-9076
Scientific domain
Biochemistry, molecular biology, biophysics; General chemistry, physical chemistry; Atomic molecular physics
Publisher
Royal Society of Chemistry, Cambridge
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Couche mince Croissance Diffraction Diffusion RX Dépôt Epaisseur Faisceau moléculaire Film In situ Incidence rasante Morphologie Oxyde Rugosité Semiconducteur Silicium Structure Surface lisse Temps réel Rubrène
Keyword (en)
Thin film Growth Diffraction X ray scattering Deposition Thickness Molecular beam Film In situ Grazing incidence Morphology Oxides Roughness Semiconductor materials Silicon Structure Smooth surface Real time
Keyword (es)
Capa fina Crecimiento Difracción Difusión rayo X Depósito Espesor Haz molecular Película In situ Incidencia rasante Morfología Óxido Rugosidad Semiconductor(material) Silicio Estructura Superficie lisa Tiempo real
Classification
Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry

Discipline
General chemistry and physical chemistry
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17717769

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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