The preparation of polyaniline intercalated MoO3 thin film and its sensitivity to volatile organic compounds
- Author
- JUNZHONG WANG1 ; MATSUBARA, Ichiro1 ; MURAYAMA, Norimitsu1 ; WOOSUCK, Shin1 ; IZU, Noriya1
[1] National Institute of Advanced Industrial Science and Technology, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560, Japan - Source
Thin solid films. 2006, Vol 514, Num 1-2, pp 329-333, 5 p ; ref : 28 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- Chemical vapour deposition (CVD) Molybdenum oxide Polymers Sensors
- Keyword (fr)
- Aniline polymère Capteur Composé binaire Composé insertion Conductivité électrique Cristallisation Diffraction RX Dépôt chimique phase vapeur Echange ion Effet concentration Etude expérimentale Film Microscopie électronique balayage Molybdène oxyde Orientation préférentielle Résistivité électrique Mo O MoO3 Substrat LaAlO3 Composé minéral Composé organique Métal transition composé
- Keyword (en)
- Polyanilines Sensors Binary compounds Intercalation compounds Electrical conductivity Crystallization XRD CVD Ion exchange Quantity ratio Experimental study Films Scanning electron microscopy Molybdenum oxides Preferred orientation Electric resistivity Inorganic compounds Organic compounds Transition element compounds
- Keyword (es)
- Orientación preferencial
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 18005333
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2006.02.030 
https://dx.doi.org/10.1016/j.tsf.2006.02.030
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