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Temperature homogeneity of polysilicon rods in a Siemens reactor

Author
DEL COSO, G1 ; TOBIAS, I1 ; CANIZO, C1 ; LUQUE, A1
[1] Instituto de Energía Solar, Universidad Politécnica de Madrid, E.T.S.I. Telecomunicación, Ciudad Universitaria, 28040 Madrid, Spain
Source

Journal of crystal growth. 2007, Vol 299, Num 1, pp 165-170, 6 p ; ref : 17 ref

CODEN
JCRGAE
ISSN
0022-0248
Scientific domain
Crystallography; Geology; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
40/44 A1. Heat transfer; A1. Magnetic fields; A2. Siemens process; B2. Semiconducting silicon
Keyword (fr)
Champ magnétique Champ température Croissance cristalline Densité courant Equation différentielle Facteur réflexion Méthode phase fondue Polycristal Semiconducteur Silicium polycristallin Traitement thermique Transfert chaleur 8110F Si
Keyword (en)
Magnetic fields Temperature distribution Crystal growth Current density Differential equations Reflectivity Growth from melt Polycrystals Semiconductor materials Polysilicon Heat treatments Heat transfer
Keyword (es)
Método fase fundida Silicio policristal
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A10 Methods of crystal growth; physics of crystal growth / 001B80A10F Growth from melts; zone melting and refining

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18522171

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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