Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field
- Author
- UEDA, M1 ; TAN, I. H1 ; DALLAQUA, R. S1 ; ROSSI, J. O1
[1] Associated Laboratory of Plasma, National Institute for Space Research, S.J. Campos, S. Paulo, Brazil - Conference title
- Proceedings of the VIIIth International Workshop on Plasma-Based Ion Implantation and Deposition, Chengdu, Sichuan, China, September 18-22, 2005
- Conference name
- International Workshop on Plasma-Based Ion Implantation and Deposition (BPII and D-05) (BPII and D-05) (8 ; Chengdu, Sichuan 2005-09-18)
- Author (monograph)
- HUANG, Nan (Editor)1 ; CHU, Paul K (Editor)1 ; LENG, Yongxiang (Editor)1
Southwest Jiaotong University®, China (Organiser of meeting)
[1] Southwest Jiaotong University, China - Source
Surface & coatings technology. 2007, Vol 201, Num 15, pp 6597-6600, 4 p ; ref : 7 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Author keyword
- 52.77.Dq 81.15.Jj Magnetic suppression Plasma immersion ion implantation Secondary electrons
- Keyword (fr)
- Azote ion Champ magnétique Effet champ magnétique Implantation ion Plasma Traitement surface
- Keyword (en)
- Nitrogen ions Magnetic fields Magnetic field effects Ion implantation Plasma Surface treatments
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A90 Other topics in materials science
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment / 001D11C06F Other surface treatments
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 18654330
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1016/j.surfcoat.2006.09.054 
https://dx.doi.org/10.1016/j.surfcoat.2006.09.054
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2006.09.054\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:3:\"201\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"6597\";s:8:\"\u0000*\u0000epage\";s:4:\"6600\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:4:\"UEDA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"M\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:9:\"TAN, I. H\";i:1;s:14:\"DALLAQUA, R. S\";i:2;s:11:\"ROSSI, J. O\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:144:\"Proceedings of the VIIIth International Workshop on Plasma-Based Ion Implantation and Deposition, Chengdu, Sichuan, China, September 18-22, 2005\";s:8:\"\u0000*\u0000title\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:8:\"\u0000*\u0000place\";s:8:\"Lausanne\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2006.09.054\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:3:\"201\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"6597\";s:8:\"\u0000*\u0000epage\";s:4:\"6600\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:4:\"UEDA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"M\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:9:\"TAN, I. H\";i:1;s:14:\"DALLAQUA, R. S\";i:2;s:11:\"ROSSI, J. O\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:144:\"Proceedings of the VIIIth International Workshop on Plasma-Based Ion Implantation and Deposition, Chengdu, Sichuan, China, September 18-22, 2005\";s:8:\"\u0000*\u0000title\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:8:\"\u0000*\u0000place\";s:8:\"Lausanne\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2006.09.054\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2006.09.054\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:3:\"201\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"6597\";s:8:\"\u0000*\u0000epage\";s:4:\"6600\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:4:\"UEDA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"M\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:9:\"TAN, I. H\";i:1;s:14:\"DALLAQUA, R. S\";i:2;s:11:\"ROSSI, J. O\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:144:\"Proceedings of the VIIIth International Workshop on Plasma-Based Ion Implantation and Deposition, Chengdu, Sichuan, China, September 18-22, 2005\";s:8:\"\u0000*\u0000title\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:8:\"\u0000*\u0000place\";s:8:\"Lausanne\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2006.09.054\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:3:\"201\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"6597\";s:8:\"\u0000*\u0000epage\";s:4:\"6600\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:4:\"UEDA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"M\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:9:\"TAN, I. H\";i:1;s:14:\"DALLAQUA, R. S\";i:2;s:11:\"ROSSI, J. O\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:144:\"Proceedings of the VIIIth International Workshop on Plasma-Based Ion Implantation and Deposition, Chengdu, Sichuan, China, September 18-22, 2005\";s:8:\"\u0000*\u0000title\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:8:\"\u0000*\u0000place\";s:8:\"Lausanne\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2006.09.054\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:3:\"201\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"6597\";s:8:\"\u0000*\u0000epage\";s:4:\"6600\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:4:\"UEDA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"M\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:9:\"TAN, I. H\";i:1;s:14:\"DALLAQUA, R. S\";i:2;s:11:\"ROSSI, J. O\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:144:\"Proceedings of the VIIIth International Workshop on Plasma-Based Ion Implantation and Deposition, Chengdu, Sichuan, China, September 18-22, 2005\";s:8:\"\u0000*\u0000title\";s:96:\"Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field\";s:8:\"\u0000*\u0000place\";s:8:\"Lausanne\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
