An intense-current electron beam source with low-level plasma formation
- Author
- LIMIN LI1 ; LIE LIU1 ; JIANCHUN WEN1 ; TAO MEN1 ; YONGGUI LIU1
[1] College of Photoelectric Science and Engineering, National University of Defense Technology, Changsha 410073, China - Source
Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 12 ; 125201.1-125201.7 ; ref : 23 ref
- CODEN
- JPAPBE
- ISSN
- 0022-3727
- Scientific domain
- Condensed state physics; Physics; Plasma physics
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Carbone Domaine temps ns Durée impulsion Emission électronique Etude expérimentale Expansion plasma Faisceau électron Forte intensité Gaine plasma Générateur impulsion haute tension Impulsion ultracourte Revêtement 5240K Source électron
- Keyword (en)
- Carbon ns range Pulse width Electron emission Experimental study Plasma expansion Electron beams High current Plasma sheaths High-voltage pulse generators Ultrashort pulse Coatings
- Keyword (es)
- Duración impulso Gran amperaje Impulsión ultracorto
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B40 Plasma interactions (nonlaser) / 001B50B40K Plasma sheaths
- Discipline
- Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20431541
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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