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Pattern transfer on a vertical cavity sidewall using SU8

Author
VERHAAR, T. M1 ; WEI, J1 ; SARRO, P. M1
[1] DIMES (Delft Institute of Microsystems and Nanoelectronics), Electronic Components, Technology and Materials Laboratory, Delft University of Technology, Feldmannweg 17, 2628 CT Delft, Netherlands
Conference name
MicroMechanics Europe Worshop (MME) (MME) (19 ; Aachen 2008-09-28)
Source

Journal of micromechanics and microengineering (Print). 2009, Vol 19, Num 7 ; 074018.1-074018.6 ; ref : 11 ref

ISSN
0960-1317
Scientific domain
Electronics; Mechanical engineering
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Conference Paper
Language
English
Keyword (fr)
Cavité Compatibilité Dispositif microélectromécanique Formation motif Microstructure élancée Métal Photorésist Procédé dépôt Procédé revêtement Remplissage
Keyword (en)
Cavity Compatibility Microelectromechanical device Patterning High aspect ratio microstructure HARM Metal Photoresist Deposition process Coating process Filling
Keyword (es)
Cavidad Compatibilidad Dispositivo microelectromecánico Formacíon motivo Microestructura esbelta Metal Fotorresistencia Procedimiento revestimiento Procedimiento revestimiento Relleno
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G10 Mechanical instruments, equipment and techniques / 001B00G10C Micromechanical devices and systems

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D12 Mechanical engineering. Machine design / 001D12I Precision engineering, watch making

Discipline
Electronics Mechanical engineering. Mechanical construction. Handling Metrology
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
21738115

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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