Plastic deformation magnetic assembly of out-of-plane structures using vapour phase hydrofluoric (HF) acid release
- Author
- ARGYRAKIS, P1 ; CHEUNG, R1
[1] School of Engineering, Scottish Microelectronics Centre, The University of Edinburgh, King's Buildings, West Mains Road, Edinburgh EH9 3JF, United Kingdom - Source
Microelectronic engineering. 2009, Vol 86, Num 11, pp 2176-2179, 4 p ; ref : 24 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Dry release method Hydrofluoric acid Plastic deformation magnetic assembly
- Keyword (fr)
- Composition chimique Couche oxyde Couche sacrificielle Déformation plastique Dépôt électrolytique Fabrication microélectronique Microscopie électronique balayage Microstructure Spectre photoélectron RX Structure plane Structure surface 0779
- Keyword (en)
- Chemical composition Oxide layer Sacrificial layer Plastic deformation Electrodeposition Microelectronic fabrication Scanning electron microscopy Microstructure X-ray photoelectron spectra Plane structure Surface structure
- Keyword (es)
- Composición química Capa óxido Capa sacrificial Deformación plástica Depósito electrolítico Fabricación microeléctrica Microscopía electrónica barrido Microestructura Estructura plana Estructura superficie
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21984011
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2009.02.035 
https://dx.doi.org/10.1016/j.mee.2009.02.035
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