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Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

Author
PIRES, David1 ; HEDRICK, James L2 ; DE SILVA, Anuja3 ; FROMMER, Jane2 ; GOTSMANN, Bernd1 ; WOLF, Heiko1 ; DESPONT, Michel1 ; DUERIG, Urs1 ; KNOLL, Armin W1
[1] IBM Research-Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland
[2] IBM Research-Almaden, 650 Harry Road, San Jose, CA 95120, United States
[3] IBM Research-Watson, T. J. Watson Research Center, Yorktown Heights, NY 10598, United States
Source

Science (Washington, D.C.). 2010, Vol 328, Num 5979, pp 732-735, 4 p ; ref : 33 ref

CODEN
SCIEAS
ISSN
0036-8075
Scientific domain
Multidisciplinary
Publisher
American Association for the Advancement of Science, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Fabrication microélectronique Formation motif Nanolithographie Résist Structure 3 dimensions Lithographie en champ proche
Keyword (en)
Microelectronic fabrication Patterning Nanolithography Resist Three dimensional structure Scanning probe lithography
Keyword (es)
Fabricación microeléctrica Formacíon motivo Resistencia Estructura 3 dimensiones
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22744306

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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