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Meniscus-Confined Three-Dimensional Electrodeposition for Direct Writing of Wire Bonds

Author
JIE HU1 ; YU, Min-Feng1
[1] Department of Mechanical Science and Engineering, University of Illinois, 1206 West Green Street, Urbana, IL 61801, United States
Source

Science (Washington, D.C.). 2010, Vol 329, Num 5989, pp 313-316, 4 p

CODEN
SCIEAS
ISSN
0036-8075
Scientific domain
Multidisciplinary
Publisher
American Association for the Advancement of Science, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Circuit intégré Dépôt électrolytique Echelle nanométrique Fabrication microélectronique Interconnexion Microcâblage Miniaturisation Modèle 3 dimensions Nanostructure Stabilité thermodynamique Structure 3 dimensions Traitement automatique Ecriture directe
Keyword (en)
Integrated circuit Electrodeposition Nanometer scale Microelectronic fabrication Interconnection Wire bonding Miniaturization Three dimensional model Nanostructure Thermodynamic stability Three dimensional structure Automatic processing Direct writing
Keyword (es)
Circuito integrado Depósito electrolítico Fabricación microeléctrica Interconexión Unión por hilo Miniaturización Modelo 3 dimensiones Nanoestructura Estabilidad termodinámica Estructura 3 dimensiones Tratamiento automático
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03A General (including economical and industrial fields)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
23025810

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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