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Two-phases epitaxial growth of erbium silicide on Si ( 1 0 0)

Author
FRANGIS, N1
[1] Solid State Physics Section, Department of Physics, Aristotle University of Thessaloniki, 54124 Thessaloniki, Greece
Source

Physica. E, low-dimentional systems and nanostructures. 2010, Vol 43, Num 1, pp 176-181, 6 p ; ref : 22 ref

ISSN
1386-9477
Scientific domain
Crystallography; Electronics; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Couche épitaxique Epitaxie Face cristalline Interface Microscopie électronique Mécanisme croissance Réseau hexagonal Réseau quadratique Surcouche 6146 Substrat silicium
Keyword (en)
Epitaxial layers Epitaxy Crystal faces Interfaces Electron microscopy Growth mechanism Hexagonal lattices Tetragonal lattices Overlayers
Keyword (es)
Mecanismo crecimiento
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A46 Nanoscale materials: clusters, nanoparticles, nanotubes, and nanocrystals

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
23625304

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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