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Electronic and magnetic properties of silicon adsorption on graphene

Author
HU, C. H1 ; ZHENG, Y1 ; ZHANG, Y1 ; WU, S. Q1 ; WEN, Y. H1 ; ZHU, Z. Z1
[1] Department of Physics and Institute of Theoretical Physics and Astrophysics, Xiamen University, Xiamen 361005, China
Source

Solid state communications. 2011, Vol 151, Num 17, pp 1128-1130, 3 p ; ref : 23 ref

CODEN
SSCOA4
ISSN
0038-1098
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
A. Surfaces and interfaces C. Point defects D. Electronic states
Keyword (fr)
Adatome Adsorption Degré recouvrement Densité état électron Défaut ponctuel Graphène Méthode fonctionnelle densité Propriété magnétique Semimétal Silicium Spin polarisé Stabilité structurale Structure électronique
Keyword (en)
Adatoms Adsorption Coverage rate Electronic density of states Point defects Graphene Density functional method Magnetic properties Semimetals Silicon Polarized spin Structure stability Electronic structure
Keyword (es)
Grado recubrimiento Graphene Spin polarizado Estabilidad estructural
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C22 Electronic structure of nanoscale materials : clusters, nanoparticles, nanotubes, and nanocrystals

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
24402800

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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