Self-Assembly Patterning for sub-15nm Half-Pitch: A Transition from Lab to Fab
- Author
- BENCHER, Chris1 ; SMITH, Jeffrey1 ; HINSBERG, William D2 ; LIYAN MIAO1 ; CAI, Cathy1 ; YONGMEI CHEN1 ; CHENG, Joy Y2 ; SANDERS, Daniel P2 ; TJIO, Melia2 ; TRUONG, Hoa D2 ; HOLMES, Steven3
[1] Applied Materials, Inc., 3225 Oakmead Village Drive, Santa Clara CA 95054, United States
[2] IBM Almaden Research Center, 650 Harry Road, San Jose CA 95120, United States
[3] IBM Albany Nanotech, 257 Fuller Road, Albany, NY 12203, United States - Conference title
- Alternative lithographic technologies III (1-3 March 2011, San Jose, California, United States)
- Conference name
- Alternative lithographic technologies (03 ; San Jose CA 2011)
- Author (monograph)
- Herr, Daniel J. C (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970 ; 79700F.1-79700F.9 ; ref : 7 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8529-8
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Autoassemblage Densité défaut Dislocation Fabrication microélectronique Ligne de base Polymère Séparation phase
- Keyword (en)
- Self assembly Defect density Dislocation Microelectronic fabrication Baseline Polymer Phase separation
- Keyword (es)
- Autoensamble Densidad defecto Dislocación Fabricación microeléctrica Línea de base Polímero Separación fase
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24470085
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.881293 
https://dx.doi.org/10.1117/12.881293
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