Thin film characterization of zinc tin oxide deposited by thermal atomic layer deposition
- Author
- MULLINGS, Marja N1 ; HÄGGLUND, Carl1 ; TANSKANEN, Jukka T1 ; YESHENG YEE2 ; GEYER, Scott1 ; BENT, Stacey F1
[1] Department of Chemical Engineering, Stanford University, Stanford, CA 94305, United States
[2] Department of Electrical Engineering, Stanford University, Stanford, CA 94305, United States - Source
Thin solid films. 2014, Vol 556, pp 186-194, 9 p ; ref : 69 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Atomic layer deposition Thin film Transparent conductive oxide Zinc tin oxide
- Keyword (fr)
- Bande interdite Bicouche Contrôle épaisseur Couche mince Couche oxyde Couche tampon Croissance cristalline en phase vapeur Diffraction RX Dispositif couche mince Ellipsométrie spectroscopique Indice réfraction Microscopie électronique balayage Mécanisme croissance Méthode couche atomique Oxyde d'étain Oxyde de zinc Plasma couplé inductivement Propriété optique Précurseur Spectre visible Structure lamellaire Taux croissance Zinc 0760F 5280Y 6855A 8115K ZnO
- Keyword (en)
- Energy gap Bilayers Thickness control Thin films Oxide layer Buffer layer Crystal growth from vapors XRD Thin film devices Spectroscopic ellipsometry Refractive index Scanning electron microscopy Growth mechanism Atomic layer method Tin oxide Zinc oxide Inductively coupled plasma Optical properties Precursor Visible spectra Lamellar structure Growth rate Zinc
- Keyword (es)
- Capa óxido Capa tampón Elipsometría espectroscópica Mecanismo crecimiento Método capa atómica Estaño óxido Zinc óxido Estructura lamelar
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G60 Optical instruments, equipment and techniques / 001B00G60F Polarimeters and ellipsometers
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B80 Electric discharges / 001B50B80Y Discharges for spectral sources (including inductively coupled plasmas)
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15A Theory and models of film growth
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase
- Discipline
- Metrology Physics and materials science Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 28331831
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2014.01.068 
https://dx.doi.org/10.1016/j.tsf.2014.01.068
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