Deposition of cobalt and nickel sulfide thin films from thio- and alkylthio-urea complexes as precursors via the aerosol assisted chemical vapour deposition technique

MGABI, L. P; DLADLA, B. S; MALIK, M. A; GARJE, Shivram S; AKHTAR, J; REVAPRASADU, N

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Deposition of cobalt and nickel sulfide thin films from thio- and alkylthio-urea complexes as precursors via the aerosol assisted chemical vapour deposition technique

Author

MGABI, L. P¹ ; DLADLA, B. S¹ ; MALIK, M. A² ; GARJE, Shivram S³ ; AKHTAR, J⁴ ; REVAPRASADU, N¹
[1] Department of Chemistry, University ofZululand, Private bag X1001 KwaDlangezwa, 3880, South Africa
[2] School of Chemistry, The University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
[3] Department of Chemistry, University of Mumbai, Vidyanagari, Santacruz (East), Mumbai 400098, India
[4] Nanoscience and Materials Synthesis Lab, Department of Physics, COMSATS, Institute of Information Technology (CIIT), Chak shahzad, Islamabad, Pakistan

Source

Thin solid films. 2014, Vol 564, pp 51-57, 7 p ; ref : 27 ref

CODEN: THSFAP
ISSN: 0040-6090
Scientific domain: Crystallography; Metallurgy, welding; Condensed state physics

Publisher

Elsevier, Amsterdam

Publication country: Netherlands

Document type

Article

Language: English

Author keyword

Aerosol-assisted chemical vapor deposition Nickel cobalt sulfide Thin films

Keyword (fr)

Analyse Fourier Aérosol Cobalt Complexe alkylthio Couche mince Cristallinité Diffraction RX Dépôt chimique phase vapeur Ligand Microscopie électronique balayage Morphologie Nickel Particule sphérique Précurseur Spectrométrie transformée Fourier Sulfure Thermogravimétrie Thiourée Thiourées Thrombocyte Urée 6855J 8115G

Keyword (en)

Fourier analysis Aerosols Cobalt Alkylthio complex Thin films Crystallinity XRD CVD Ligands Scanning electron microscopy Morphology Nickel Spherical particle Precursor Fourier transform spectroscopy Sulfides Thermogravimetry Thiourea Thioureas Blood platelets Urea

Keyword (es)

Complejo alquiltio Cristalinidad Partícula esférica

Classification

Pascal: 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pascal: 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Discipline

Physics and materials science Physics of condensed state : structure, mechanical and thermal properties

Origin

Inist-CNRS

Database: PASCAL
INIST identifier: 28601504

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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Deposition of cobalt and nickel sulfide thin films from thio- and alkylthio-urea complexes as precursors via the aerosol assisted chemical vapour deposition technique

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