Holmium titanium oxide thin films grown by atomic layer deposition

KUKLI, Kaupo; KEMELL, Marianna; MUKESH CHANDRA DIMRI; PUUKILAINEN, Esa; TAMM, Aile; STERN, Raivo

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Holmium titanium oxide thin films grown by atomic layer deposition

Author

KUKLI, Kaupo¹ ² ; KEMELL, Marianna¹ ; MUKESH CHANDRA DIMRI³ ; PUUKILAINEN, Esa¹ ; TAMM, Aile² ; STERN, Raivo³ ; RITALA, Mikko¹ ; LESKELÄ, Markku¹
[1] University of Helsinki, Department of Chemistry, University of Helsinki, P.O. Box 55, 00014 Helsinki, Finland
[2] University of Tarru, Institute of Physics, Department of Materials Science, Ravila 14c, 50411 Tartu, Estonia
[3] National Institute of Chemical Physics and Biophysics, Akadeemia tee 23, 12618 Tallinn, Estonia

Source

Thin solid films. 2014, Vol 565, pp 261-266, 6 p ; ref : 26 ref

CODEN: THSFAP
ISSN: 0040-6090
Scientific domain: Crystallography; Metallurgy, welding; Condensed state physics

Publisher

Elsevier, Amsterdam

Publication country: Netherlands

Document type

Article

Language: English

Author keyword

Atomic layer deposition Crystal growth Magnetic materials

Keyword (fr)

Aimantation saturation Couche mince amorphe Couche mince Croissance cristalline en phase vapeur Croissance cristalline Magnétométrie Matériau magnétique Méthode couche atomique Oxyde de titane Précurseur Recuit Titane 8115K Substrat silicium

Keyword (en)

Saturation magnetization Amorphous thin film Thin films Crystal growth from vapors Crystal growth Magnetometry Magnetic materials Atomic layer method Titanium oxide Precursor Annealing Titanium

Keyword (es)

Imanación saturación Capa fina amorfa Magnetometría Método capa atómica Titanio óxido

Classification

Pascal: 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase

Discipline

Physics and materials science

Origin

Inist-CNRS

Database: PASCAL
INIST identifier: 28697430

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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Holmium titanium oxide thin films grown by atomic layer deposition

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