Tin-Incorporation Induced Changes in the Microstructural, Optical, and Electrical Behavior of Tungsten Oxide Nanocrystalline Thin Films Grown Via Spray Pyrolysis
- Author
- MUKHERJEE, Ramnayan1 ; PRAJAPATI, C. S2 ; SAHAY, P. P1
[1] Department of Physics, Motilal Nehru National Institute of Technology, Allahabad 211 004, India
[2] Center for Nano Science and Engineering, Indian Institute of Science, Bangalore 560012, India - Source
Journal of thermal spray technology. 2014, Vol 23, Num 8, pp 1445-1455, 11 p ; ref : 52 ref
- ISSN
- 1059-9630
- Scientific domain
- Metallurgy, welding
- Publisher
- Springer, Heidelberg
- Publication country
- Germany
- Document type
- Article
- Language
- English
- Author keyword
- Sn-doped WO3 thin films electrical properties spray pyrolysis structural and optical properties
- Keyword (fr)
- Couche mince Couche oxyde Dopage Microstructure Nanocristal Oxydation Oxyde de tungstène Propriété optique Propriété électrique Pyrolyse Traitement surface
- Keyword (en)
- Thin film Oxide layer Doping Microstructure Nanocrystal Oxidation Tungsten oxide Optical properties Electrical properties Pyrolysis Surface treatment
- Keyword (es)
- Capa fina Capa óxido Doping Microestructura Nanocristal Oxidación Wolframio óxido Propiedad óptica Propiedad eléctrica Pirólisis Tratamiento superficie
- Keyword (de)
- Duennschicht Oxidschicht Dopen Mikrogefuege Oxidation Wolframoxid Optische Eigenschaft Elektrische Eigenschaft Pyrolyse Oberflaechenbehandlung
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 29042097
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/s11666-014-0134-x 
https://dx.doi.org/10.1007/s11666-014-0134-x
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