Synthesis of carbon nitride films by magnetically rotated arc-plasma jet chemical vapor deposition
- Author
- TYAN-YWAN YEN; CHANG-PIN CHOU
National Chiao Tung univ., dep.mechanical eng., Hsinchu 30050, Taiwan, Province of China - Source
Solid state communications. 1995, Vol 95, Num 5, pp 281-286 ; ref : 29 ref
- CODEN
- SSCOA4
- ISSN
- 0038-1098
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- CVD Carbone nitrure Composé binaire Curium Loi Hooke SEM Spectrométrie Raman TEM
- Keyword (en)
- CVD Carbon nitrides Binary compounds Curium Hooke law SEM Raman spectroscopy TEM
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3541158
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0038-1098(95)00275-8 
https://dx.doi.org/10.1016/0038-1098(95)00275-8
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