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Optical second-harmonic generation study of Si and Ge deposition on Si(001)

Author
HOLLERING, R. W. J; HOEVEN, A. J; LENSSINCK, J. M
Philips Research Laboratories, Eindhoven JA 5600, Netherlands
Source

Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1990, Vol 8, Num 4, pp 3194-3197 ; ref : 20 ref

CODEN
JVTAD6
ISSN
0734-2101
Scientific domain
Metallurgy, welding; Physics
Publisher
American Institute of Physics, Melville, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Couche mince Dépôt Etude expérimentale Monocristal Ultravide Intensité second harmonique Méthode optique Structure électronique
Keyword (en)
Thin film Deposition Experimental study Single crystal Ultrahigh vacuum
Keyword (es)
Capa fina Depósito Estudio experimental Monocristal Ultravacío
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H90 Other topics in structure, and nonelectronic properties of surfaces and interfaces; thin films and whiskers

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
4423686

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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