A study of the oxidation of selected metal silicides
- Author
- FRAMPTON, R. D1 ; IRENE, E. A; D'HEURLE, F. M
[1] Univ. North Carolina, dep. chemistry, Chapel Hill NC 27514, United States - Source
Journal of applied physics. 1987, Vol 62, Num 7, pp 2972-2980 ; ref : 63 ref
- CODEN
- JAPIAU
- ISSN
- 0021-8979
- Scientific domain
- Crystallography; Electronics; Optics; Condensed state physics; Physics
- Publisher
- American Institute of Physics, Woodbury, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Cinétique Composé minéral Couche mince Ellipsométrie Epaisseur Etude expérimentale Indice réfraction Métal transition Composé Métal transition Siliciure Oxydation Température Traitement surface Support Si
- Keyword (en)
- Kinetics Inorganic compound Thin film Ellipsometry Thickness Experimental study Refraction index Transition metal Compounds Transition metal Silicides Oxidation Temperature Surface treatment
- Keyword (es)
- Cinética Compuesto mineral Capa fina Elipsometría Espesor Estudio experimental Indice refracción Metal transición Metal transición Oxidación Temperatura Tratamiento superficie
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 7695069
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1063/1.339383 
https://dx.doi.org/10.1063/1.339383
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