CIRCULAR ETCH PITS IN ION-IMPLANTED AMORPHOUS SILICON FILMS
- Author
- TU KN; TAN SI; CROWDER BL
IBM THOMAS J. WATSON RES. CENT., YORKTOWN HEIGHTS, N.Y. - Source
- APPL. PHYS. LETTERS; U.S.A.; DA. 1973; VOL. 22; NO 6; PP. 274-275; BIBL. 4 REF.
- Document type
- Serial Issue
- Language
- English
- Keyword (fr)
- ATTAQUE CHIMIQUE FIGURE ATTAQUE MATERIAU SEMICONDUCTEUR MATERIAU AMORPHE SILICIUM CONFIGURATION CIRCULAIRE IMPLANTATION IONIQUE EVAPORATION SOUS VIDE COUCHE MINCE TECHNOLOGIE ETAT AMORPHE PIQURE ATTAQUE METHODE PHASE VAPEUR MICROSCOPIE ELECTRONIQUE ELECTROMAGNETISME ELECTRONIQUE CRISTALLOGRAPHIE
- Keyword (en)
- ELECTROMAGNETISM ELECTRONICS CRISTALLOGRAPHY
- Keyword (es)
- ELECTROMAGNETISMO ELECTRONICA CRISTALOGRAFIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Electronics Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7314512537
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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