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DRY PROCESS TECHNOLOGY (REACTIVE ION ETCHING).

Author
BONDUR JA
I.B.M., SYST. PROD. DIV., HOPEWELL JUNCTION, N.Y. 12533
Source
J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1976; VOL. 13; NO 5; PP. 1023-1029; BIBL. 14 REF.
Document type
Article
Language
English
Keyword (fr)
GRAVURE FAISCEAU IONIQUE FABRICATION MICROELECTRONIQUE METAL DIELECTRIQUE MATERIAU SEMICONDUCTEUR DECHARGE ELECTRIQUE DECHARGE HAUTE FREQUENCE GRAVURE PLASMA APPLICATION PLASMA ELECTROMAGNETISME ELECTRONIQUE
Keyword (en)
ION BEAM ETCHING MICROELECTRONIC FABRICATION METAL DIELECTRIC MATERIALS ELECTRIC DISCHARGE HIGH FREQUENCY DISCHARGE PLASMA ETCHING PLASMA APPLICATION ELECTROMAGNETISM ELECTRONICS
Keyword (es)
ELECTROMAGNETISMO ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7730108130

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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