A DOUBLE-EXPOSURE TECHNIQUE TO MACROSCOPICALLY CONTROL SUB MICROMETER LINEWIDTHS IN POSITIVE RESIST IMAGES
- Author
- LIN BJ
I.B.M. THOMAS J. WATSON RES. CENT., YORKTOWN HEIGHTS NY, USA - Source
- I.E.E.E. TRANS. ELECTRON DEVICES; USA; DA. 1978; VOL. 25; NO 4; PP. 419-424; BIBL. 8 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- LITHOGRAPHIE EXPOSITION CONTROLE VISUEL CONTROLE AUTOMATIQUE LARGEUR FABRICATION MICROELECTRONIQUE ETALONNAGE RESINE PHOTORESIST RESINE POSITIVE LIMITE RESOLUTION ELECTRONIQUE
- Keyword (en)
- LITHOGRAPHY EXPOSURE VISUAL CONTROL AUTOMATIC MONITORING WIDTH MICROELECTRONIC FABRICATION CALIBRATION RESINS PHOTORESIST RESOLVING POWER ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7930175975
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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