CONTACT REACTION BETWEEN SI AND PD-W ALLOY FILMS
- Author
- OLOWOLAFE JO; TU KN; ANGILELLO J
I.B.M.T.J. WATSON RES. CENT.,YORKTOWN HEIGHTS NY 10598,USA - Source
- J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1979; VOL. 50; NO 10; PP. 6316-6320; BIBL. 20 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- CONTACT ELECTRIQUE CONTACT METAL SEMICONDUCTEUR SILICIUM ALLIAGE TUNGSTENE ALLIAGE PALLADIUM BARRIERE SCHOTTKY BARRIERE POTENTIEL MESURE RETRODIFFUSION DIFFRACTION RX REACTION CHIMIQUE HAUTEUR BARRIERE ELECTRONIQUE PHYSIQUE SOLIDE
- Keyword (en)
- ELECTRIC CONTACT SEMICONDUCTOR METAL CONTACT SILICON SCHOTTKY BARRIER POTENTIAL BARRIER MEASUREMENT BACKSCATTERING X-RAY DIFFRACTION ANALYSIS CHEMICAL REACTION BARRIER HEIGHT ELECTRONICS SOLID PHYSICS
- Keyword (es)
- ELECTRONICA FISICA DEL ESTADO CONDENSADO
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties
- Discipline
- Electronics Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8030185962
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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