COMPARISON OF OXIDES PREPARED IN CW AND PULSE MICROWAVE PLASMA
- Author
- MUSIL J; BARDOS L; HULENYI L; LONCAR G
CZECHOSLOVAK ACAD. SCI., INST. PLASMA PHYS./PRAGUE 18200/CSK - Source
- PHYS. STATUS SOLIDI (A), APPL. RES.; ISSN 0031-8965; DDR; DA. 1980; VOL. 61; NO 2; PP. 631-634; ABS. RUS; BIBL. 6 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- CARACTERISTIQUE CAPACITE TENSION SUSCEPTIBILITE MAGNETIQUE DEFAUT CRISTALLIN PROPRIETE ELECTRIQUE PREPARATION SUPPORT COUCHE MINCE SILICIUM OXYDE PHYSIQUE SOLIDE
- Keyword (en)
- VOLTAGE CAPACITY CURVE MAGNETIC SUSCEPTIBILITY CRYSTAL DEFECT DEFECTS ELECTRICAL PROPERTIES PREPARATION THIN FILM SILICA SOLID PHYSICS
- Keyword (es)
- FISICA DEL ESTADO CONDENSADO
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8130405190
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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