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THE INITIAL GROWTH OF VAPOUR DEPOSITED GOLD FILMS

Author
ANDERSSON TG
CHALMERS UNIV. OF TECHNOLOGY. DEPT. OF PHYSICS/GOETEBORG/SWE
Source
GOLD BULL.; ZAF; DA. 1982-01; VOL. 15; NO 1; PP. 7-18; BIBL. 41 REF.
Document type
Article
Language
English
Keyword (fr)
DEPOT PHASE VAPEUR SEMICONDUCTEUR CONTACT ELECTRIQUE GERMINATION COUCHE SUPERFICIELLE TEMPERATURE AMBIANTE HAUTE TEMPERATURE SPECTROMETRIE AUGER CARBONE!ACT OXYGENE!ACT POTASSIUM!ACT ENERGIE LIAISON DIFFRACTION ELECTRON LENT METAL PUR AU!SEC METAL PUR SI!SUB GAAS!SUB METALLURGIE
Keyword (en)
VAPOUR DEPOSITION SEMICONDUCTOR ELECTRIC CONTACT NUCLEATION SURFACE FILM ROOM TEMPERATURE HIGH TEMPERATURE AUGER ELECTRON SPECTROMETRY CARBON!ACT OXYGEN!ACT POTASSIUM!ACT BINDING ENERGY DIFFRACTION LEED METALLURGY
Keyword (es)
METALURGIA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Discipline
Metals. Metallurgy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8300225360

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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