CONTACT RESISTANCE BEHAVIOR OF THE PD2 SI-AL CU SI SYSTEM
- Author
- SUGERMAN A; TSAI HJ; KRISTOFF JS; REGH J
IBM, GEN. TECHNOLOGY DIV./HOPEWELL JUNCTION NY 12533/USA - Source
- JOURNAL OF ELECTRONIC MATERIALS; ISSN 0361-5235; USA; DA. 1982; VOL. 11; NO 5; PP. 943-955; BIBL. 4 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- CONTACT ELECTRIQUE PALLADIUM SILICIURE ALUMINIUM CUIVRE SILICIURE RESISTANCE CONTACT ELECTRONIQUE
- Keyword (en)
- ELECTRIC CONTACT PALLADIUM SILICIDES ALUMINIUM COPPER SILICIDES CONTACT RESISTANCE ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL83X0211474
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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