Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)Naber, Robert J; Kawahira, Hiroichi.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6887-1, 3 vol, isbn 978-0-8194-6887-1Conference Proceedings

Development status of EUVL mask blanks in AGCHAYASHI, Kazuyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67305D.1-67305D.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Industry Survey of Wafer Fab Reticle Quality Control Strategies in the 90nm -45nm design-rule ageDOVER, Russell.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67305B.1-67305B.5, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Intel's AMT enables rapid processing and Info-turn for Intel's DFM Test Chip VehicleHAJJ, Hazem.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67300Q.1-67300Q.13, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Pattern density and process related CD corrections at 32nm nodeBENES, Zdenek; KOTANI, Jun.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67304A.1-67304A.6, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Better On Wafer Performance and Mask Manufacturability of Contacts with No or Non-Traditional SerifsSAMUELS, Donald; STOBERT, Ian.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302S.1-67302S.8, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Development of Mask-DFM System MiLE Load Estimation of Mask manufacturingNAGAMURA, Yoshikazu; HOSONO, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67300N.1-67300N.9, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Improving HyperNA OPC using targeted measurements for model parameter extractionWARD, Brian S.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302O.1-67302O.11, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Mask Industry Assessment: 2007SHELDEN, Gilbert; MARMILLION, Patricia.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673003.1-673003.5, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Rapid and precise monitor of reticle hazeZAVECZ, Terrence; KASPROWICZ, Bryan.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67301B.1-67301B.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

A generic technique for reducing OPC iteration : Fast Forward OPCLE HONG; STURTEVANT, John.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302M.1-67302M.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Selecting and using a lithography compliance DFM tool for 65-nm Foundry ProductionHATAMIAN, Babak; KAPOOR, Rahul.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673011.1-673011.8, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Compositional analysis of progressive defects on a photomaskSAGA, Koichiro; KAWAHIRA, Hiroichi.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673019.1-673019.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Compressing MEBES data enabling multi-threaded decompressionPEREIRA, Mark; PARCHURI, Anil.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67303I.1-67303I.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Optimization of OPC Runtime Using Efficient Optical SimulationAL-IMAM, Mohamed.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302T.1-67302T.8, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

PMJ 2007 Panel Discussion Overview : double exposure and double patterning for 32-nm half-pitch design nodeNAGAOKA, Yoshinori; WATANABE, Hidehiro.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673006.1-673006.9, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

The study of phase-angle and transmission specifications of 6% att-EAPSM for 90nm, 65nm and 45nm node wafer manufacturing patterning processGONG CHEN; GARZA, Cesar.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302R.1-67302R.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Driving Photomask Supplier Quality Through AutomationRUSSELL, Drew; ESPENSCHEID, Andy.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302W.1-67302W.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

E-beam direct write is freeGLASSER, Lance A.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302V.1-67302V.8, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Investigation of resist effects on EUV mask defect printabilityZHIYU ZHANG; LIANG, Ted.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673016.1-673016.8, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)Martin, Patrick M; Naber, Robert J.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6444-9, 2Vol, pagination multiple, isbn 0-8194-6444-9Conference Proceedings

Simultaneous Model-based Main feature and SRAF Optimization for 2D SRAF Implementation to 32 nm critical layersYEHIA, Ayman; TRITCHKOV, Alexander.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302K.1-67302K.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Automatic Optimization of MEEF-driven Defect Disposition for Contamination Inspection ChallengesHUANG, Tracy; DAYAL, Aditya; BHATTACHARYYA, Kaustuve et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302B.1-67302B.12, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Exploring the Sources of MEEF in Contact SRAMsGALLAGHER, Emily; STOBERT, Ian; HIGUCHI, Masaru et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302I.1-67302I.9, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Images in Photoresist for Self-Interferometric Electrical Image MonitorsRUBINSTEIN, Juliet; NEUREUTHER, Andrew R.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673039.1-673039.9, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper