Photosensitive polymersIRIE, M.International journal of polymeric materials (Print). 1993, Vol 20, Num 3-4, pp 271-275, issn 0091-4037Article

Construction of stimuli-sensitive systems responsive to enzyme activityEREMEEV, N. L; KAZANSKAYA, N. F.SPIE proceedings series. 1998, pp 442-449, isbn 0-8194-2852-3Conference Paper

L'EXPLOITATION DU VERRE PHOTOCHROMIQUE.MEGLA GK.1975; ELECTRONIQUE; SUISSE; DA. 1975; VOL. 4; NO 11-12; PP. 29-37; BIBL. 13 REF.Article

CINETIQUE DE COLORATION DES VERRES PHOTOCHROMES LORS DE L'IRRADIATION PAR DES IMPULSIONSABRAMOV AP; ABRAMOVA IP; TOLSTOJ MN et al.1975; ZH. NAUCH. PRIKL. FOTOGR. KINEMATOGR.; S.S.S.R.; DA. 1975; VOL. 20; NO 2; PP. 121-125; BIBL. 13 REF.Article

Systems of digital optical memory based on two-photon amplitude data writing in three-dimensional photosensitive media with the use of femtosecond laser pulses : Comparison of phase and amplitude approaches to the problem of 3D optical memoryCHIKISHEV, A. Yu; KOROTEEV, N. I; KRIKUNOV, S. A et al.SPIE proceedings series. 1998, pp 122-128, isbn 0-8194-2852-3Conference Paper

Extinction zones and scalability in N-beam interference latticesJIMENEZ-CENICEROS, A; TREJO-DURAN, M; ALVARADO-MENDEZ, E et al.Optics communications. 2010, Vol 283, Num 3, pp 362-367, issn 0030-4018, 6 p.Article

Photo-responsive organics and polymers: Proceedings of the International Conference on Photo-responsive Organics and Polymers 2001 (ICPOP 2001), Cheju Island, Korea, August 19-25, 2001LEE, Kwang-Sup; NAKANISHI, Hachiro; KAINO, Toshikuni et al.Optical materials (Amsterdam). 2003, Vol 21, Num 1-3, issn 0925-3467, 722 p.Conference Proceedings

Hollow packaging technology employing photosensitive adhesive resinsFUNAYA, Takuo; SENBA, Naoji; MATSUI, Koji et al.SPIE proceedings series. 2000, pp 190-195, isbn 0-930815-62-9Conference Paper

Photosensitive impregnated porous glassBORRELLI, N. F; MORSE, D. L.Applied physics letters. 1983, Vol 43, Num 11, pp 992-993, issn 0003-6951Article

QUANTITATIVE EVALUATION OF PHOTORESIST PATTERNS IN THE 1-MU M RANGE.WIDMANN DW.1975; APPL. OPT.; U.S.A.; DA. 1975; VOL. 14; NO 4; PP. 931-934; BIBL. 5 REF.Article

POSSIBILITE D'UTILISATION POUR L'ENREGISTREMENT DE L'INFORMATION DES CRISTAUX DE KBR TRAITES DANS LA VAPEUR DU METAL ALCALIN AVEC ADDITION D'IONS OHLOMOVSKIJ OI.1975; ZH. NAUCH. PRIKL. FOTOGR. KINEMATOGR.; S.S.S.R.; DA. 1975; VOL. 20; NO 5; PP. 375; BIBL. 3 REF.Article

HIGH DENSITY DATA STORAGE ON ULTRAVIOLET SENSITIVE TAPE.MASLOWSKI S.1974; APPL. OPT.; U.S.A.; DA. 1974; VOL. 13; NO 4; PP. 857-860; BIBL. 4 REF.Article

PHOTOELECTRIC INDUCED ELASTOMER DEFORMATION IN PVK-TNF TYPE GAMMA -RUTICON.LAKATOS AI.1974; J. APPL. PHYS.; U.S.A.; DA. 1974; VOL. 45; NO 11; PP. 4857-4868; BIBL. 6 REF.Article

COMBINAISON DES METHODES DE MOIRE ET DE REVETEMENTS OPTIQUEMENT SENSIBLES LORS DE L'ETUDE DES DEFORMATIONS PLASTIQUESSITNIKOV LL; KROVOPUSK OF.1974; ZAVODSK. LAB.; S.S.S.R.; DA. 1974; VOL. 40; NO 4; PP. 453-455; BIBL. 4 REF.Article

MATERIAUX PHOTOCHROMIQUES ET LEUR EMPLOI EN HOLOGRAPHIEBARACHEVSKIJ VA.1975; IN: VSES. SHK. GOLOGRAFII. 7. MATER.; LENINGRAD; 1975; LENINGRAD; INST. YAD. FIZ.; DA. 1975; PP. 399-454; BIBL. 5 P.Conference Paper

EXPONENTIAL TRANSFER CURVE - APPLICATION TO PHOTOCHROMICSHOFF F; PISTEK K.1980; ACTA TECH. C.S.A.V.; CSK; DA. 1980; VOL. 25; NO 2; PP. 174-194; BIBL. 17 REF.Article

PHOTOSENSITIVE FILM FORMATION ON COPPER.TAYLOR BJ.1974; J. PHOTOGR. SCI.; G.B.; DA. 1974; VOL. 22; NO 6; PP. 305-306; BIBL. 5 REF.Article

PHOTOSENSIBILITE DES PHOTORESISTS NEGATIFSTREUSHNIKOV VM; FROLOVA NV; OLEJNIK AV et al.1979; ZH. NAUCH. PRIKL. FOTOGR. KINEMATOGR.; SUN; DA. 1979; VOL. 24; NO 5; PP. 388-396; BIBL. 41 REF.Article

EXPOSURE CONTROL FOR DRY FILM PHOTORESISTSWOPSCHALL RH.1978; ELECTRON. PACKAG. PRODUCT.; USA; DA. 1978; VOL. 18; NO 10; PP. 90-97; (6 P.); BIBL. 3 REF.Article

PROGRES DANS LE DOMAINE DE LA RECHERCHE DES MILIEUX D'ENREGISTREMENT ORGANIQUES PHOTOCHROMESBARACHEVSKIJ VA; KOZENKOV VM; KVASNIKOV ED et al.1978; USP. NAUCH. FOTOGR.; SUN; DA. 1978; VOL. 19; PP. 108-135; BIBL. 172 REF.Article

RELIEF IMAGE IN AG-CHALCOGENIDE GLASS SENSORS.SHIRAKAWA T; SHIMIZU I; KOKADO H et al.1975; PHOTOGR. SCI. ENGNG; U.S.A.; DA. 1975; VOL. 19; NO 2; PP. 139-142; BIBL. 5 REF.Article

LASER PLATEMAKERS AT WORK1979; LASER FOCUS; USA; DA. 1979; VOL. 15; NO 6; PP. 12-32; (11 P.)Article

EFFET D'ECRAN DANS LES COUCHES PHOTOCHROMES PHOTOSENSIBLES A BASE D'UN INDOLINOSPIRANELOZHKIN BT; CHURKIN AV; VANNIKOV AV et al.1979; ZH. NAUCH. PRIKL. FOTOGR. KINEMATOGR.; SUN; DA. 1979; VOL. 24; NO 2; PP. 135-138; BIBL. 3 REF.Article

SPECTROSENSITOMETRE POUR LES MATERIAUX PHOTOCHROMIQUESGRACHEVA LV; PESHKOV NM.1979; OPT.-MEKH. PROMYSHL.; SUN; DA. 1979; NO 3; PP. 26-28; BIBL. 15 REF.Article

OPTICALLY FABRICATED ELEMENTS IN FUNCTIONAL SYSTEMS.GATES JWC.1976; IN: ENG. USES COHERENT OPT. CONF. PROC.; GLASGOW; 1975; CAMBRIDGE; CAMBRIDGE UNIV. PRESS; DA. 1976; PP. (23P.); BIBL. 2 P.Conference Paper