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MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS.DILL FH; NEUREUTHER AR; TUTTLE JA et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 456-464; BIBL. 6 REF.Article

PHOTORESISTS FOR ELECTRONICS.FREY DW; HRYHORENKO EB.1978; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1978; VOL. 18; NO 1; PP. 104-105Article

PROJECTION PRINTED PHOTOLITHOGRAPHIC IMAGES IN POSITIVE PHOTORESISTS.NARASIMHAM MA.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 478-482; BIBL. 5 REF.Article

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POLY (BUTENE-1 SULFONE) - A HIGHLY SENSITIVE POSITIVE RESIST.BOWDEN MJ; THOMPSON LF; BALLANTYNE JP et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1294-1296; BIBL. 9 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

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