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Single-source cvd of 3C-SiC films in a LPCVD reactor. II. Reactor modeling and chemical kineticsVALENTE, Gianluca; WIJESUNDARA, Muthu B. J; MABOUDIAN, Roya et al.Journal of the Electrochemical Society. 2004, Vol 151, Num 3, pp C215-C219, issn 0013-4651Article
