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Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors!YIM FUN LOO; O'KANE, Ruairi; JONES, Anthony C et al.Journal of material chemistry. 2005, Vol 15, Num 19, pp 1896-1902, issn 0959-9428, 7 p.Article
