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A layer-by-layer Cat-CVD of conformal and stoichiometric silicon nitride with in-situ H2 post-treatmentKITAZOE, Makiko; OSONO, Shuuji; ITOH, Hiromi et al.Thin solid films. 2006, Vol 501, Num 1-2, pp 160-163, issn 0040-6090, 4 p.Conference Paper
