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Application of integrated scatterometry measurements for a wafer-level litho feed-back loop in a high-volume 300mm DRAM production environmentKRAMER, Uwe; FLEISCHER, Goeran; MARSCHNER, Thomas et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 615509.1-615509.9, issn 0277-786X, isbn 0-8194-6198-9, 1VolConference Paper
