1838556
Results 1 to 1 of 1
Selection :
Prediction of elementary reaction mechanism for the CVD process in Si2Cl6-H2 system using semi-empirical molecular orbital methodSAITO, N; FUWA, A.Nippon Kinzoku Gakkaishi (1952). 1999, Vol 63, Num 3, pp 319-325, issn 0021-4876Article