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Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursorsBLACK, Kate; ASPINALL, Helen C; HEYS, Peter N et al.Journal of material chemistry. 2008, Vol 18, Num 38, pp 4561-4571, issn 0959-9428, 11 p.Article
