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TiN/ZrO2/Ti/Al Metal―Insulator―Metal Capacitors With Subnanometer CET Using ALD-Deposited Zr02 for DRAM ApplicationsMONAGHAN, S; CHERKAOUI, K; O'CONNOR, E et al.IEEE electron device letters. 2009, Vol 30, Num 3, pp 219-221, issn 0741-3106, 3 p.Article