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Mechanism of amorphous silica film formation from tetraethoxysilane in atomic oxygen-induced chemical vapor depositionWROBEL, A. M; WALKIEWICZ-PIETRZYKOWSKA, A; WICKRAMANAYAKA, S et al.Journal of the Electrochemical Society. 1998, Vol 145, Num 8, pp 2866-2876, issn 0013-4651Article
