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• 001 Exact sciences and technology.
  • 001B Physics
    • 001B80 Cross-disciplinary physics: materials science; rheology. (See also 001D10, 001D09, 001D08B)
      • 001B80A Materials science. (See also 001B60D, 001B60B)
        • 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy.
          • 001B80A15A Theory and models of film growth.
          • 001B80A15C Deposition by sputtering.
          • 001B80A15E Vacuum deposition.
          • 001B80A15F Laser deposition.
          • 001B80A15G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.).
          • 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy.
          • 001B80A15J Ion and electron beam-assisted deposition; ion plating.
          • 001B80A15K Vapor phase epitaxy; growth from vapor phase.
          • 001B80A15L Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids). (See also 001C01I08, 001B60H18)
          • 001B80A15N Solid phase epitaxy; growth from solid phases.
          • 001B80A15P Electrodeposition, electroplating.
          • 001B80A15R Spray coating techniques.

Title

• fr : Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie.
• en : Methods of deposition of films and coatings; film growth and epitaxy.

Scope note

• Structure des couches minces, voir: 001B60H55.
• Structure of thin films, see: 001B60H55.

SKOS Notation

001B80A15

In the plan

Pascal Classification Scheme