Composition and microstructure of cobalt oxide thin films obtained from a novel cobalt(II) precursor by chemical vapor deposition
- Author
- BARRECA, Davide1 ; MASSIGNAN, Cristian1 ; DAOLIO, Sergio2 ; FABRIZIO, Monica2 ; PICCIRILLO, Clara3 ; ARMELAO, Lidia4 ; TONDELLO, Eugenio4
[1] Dipartimento di Chimica Inorganica, Metallorganica ed Analitica, Università di Padova, Via Loredan 4, 35131 Padova, Italy
[2] Istituto di Polarografia ed Elettrochimica Preparativa, CNR, Corso Stati Uniti 4, 35020 Padova, Italy
[3] High Vacuum Process, Via Azzoni 3b, 43100 Parma, Italy
[4] Centro di Studio sulla Stabilità e Reattività dei Composti di Coordinazione del CNR, Via Marzolo 1, 35131 Padova, Italy - Source
Chemistry of materials. 2001, Vol 13, Num 2, pp 588-593 ; ref : 49 ref
- ISSN
- 0897-4756
- Scientific domain
- Chemistry; Chemical industry parachemical industry; Polymers, paint and wood industries
- Publisher
- American Chemical Society, Washington, DC
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Basse pression Caractérisation Cobalt II Complexe Cobalt oxyde Commande processus Composition chimique Coordinat organique Couche mince Croissance cristalline en phase vapeur Dicétone Décomposition thermique Dépôt chimique phase vapeur Etude expérimentale Microstructure Mode opératoire Nanostructure Précurseur Spectre IR proche Spectre absorption Spectre visible Co O Co3O4 CoO Heptane-3,5-dione(2,2,6,6-tétraméthyl) Composé minéral Métal transition complexe Métal transition composé
- Keyword (en)
- Low pressure Characterization Cobalt II Complexes Cobalt oxides Process control Chemical composition Organic ligand Thin films Crystal growth from vapors Diketone Thermal decomposition CVD Experimental study Microstructure Operating mode Nanostructures Precursor Near infrared spectrum Absorption spectra Visible spectra Inorganic compounds Transition element complexes Transition element compounds
- Keyword (es)
- Caracterización Cobalto II Complejo Ligando orgánico Dicetona Descomposición térmica Método operatorio Espectro IR próximo
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1022579
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1021/cm001041x 
https://dx.doi.org/10.1021/cm001041x
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