Effects of direct current and pulse-plating on the co-deposition of nickel and nanometer diamond powder
- Author
- LEE, W.-H1 ; TANG, S.-C1 ; CHUNG, K.-C1
[1] Department of Mechanical Engineering, National Taipei University of Technology. 1, Sec. 3, Chung-Hsiao E. Road, Taipei, Taiwan, Province of China - Conference title
- Proceedings of the 26th International Conference on Metallurgical Coatings and Thin Films, San Diego, California, April 12-15, 1999
- Conference name
- International Conference on Metallurgical Coatings and Thin Films (26 ; San Diego, CA 1999-04-12)
- Author (monograph)
- MATTHEWS, Allan (Editor)1 ; ENSINGER, Wolfgang (Editor)2 ; GIVENS, John H (Editor)3 ; ROHDE, Suzanne L (Editor)4
American Vacuum Society ; Vacuum Metallurgy and Thin Films Divisions, United States (Funder/Sponsor)
[1] University of Hull, United Kingdom
[2] Philipps-University of Marburg, Germany
[3] VLSI Technology, Inc
[4] University of Nebraska, United States - Source
Surface & coatings technology. 1999, Vol 120-21, pp 607-611 ; ref : 7 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Codépôt Coefficient frottement Couche mince Densité courant Diamant synthétique Etude expérimentale Nanomatériau Nickel Placage SEM
- Keyword (en)
- Codeposition Friction factor Thin films Current density Synthetic diamond Experimental study Nanostructured materials Nickel Plating SEM
- Keyword (es)
- Codeposición Diamante sintético
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1214277
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0257-8972(99)00445-4 
https://dx.doi.org/10.1016/S0257-8972(99)00445-4
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