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Plasma immersion ion implantation into inner and outer races of industrial bearings

Author
ZENG, Z. M1 2 ; KWOK, T. K1 ; TIAN, X. B1 2 ; TANG, B. Y1 2 ; CHU, P. K1
[1] Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong-Kong
[2] Advanced Welding Production & Technology National Key Laboratory, Harbin Institute of Technology, Harbin, China
Conference title
Proceedings of the 26th International Conference on Metallurgical Coatings and Thin Films, San Diego, California, April 12-15, 1999
Conference name
International Conference on Metallurgical Coatings and Thin Films (26 ; San Diego, CA 1999-04-12)
Author (monograph)
MATTHEWS, Allan (Editor)1 ; ENSINGER, Wolfgang (Editor)2 ; GIVENS, John H (Editor)3 ; ROHDE, Suzanne L (Editor)4
American Vacuum Society ; Vacuum Metallurgy and Thin Films Divisions, United States (Funder/Sponsor)
[1] University of Hull, United Kingdom
[2] Philipps-University of Marburg, Germany
[3] VLSI Technology, Inc
[4] University of Nebraska, United States
Source

Surface & coatings technology. 1999, Vol 120-21, pp 663-667 ; ref : 14 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Keyword (fr)
Application plasma Etude théorique Gaine plasma Implantation ion Palier Traitement surface
Keyword (en)
Plasma applications Theoretical study Plasma sheaths Ion implantation Bearings Surface treatments
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications

Discipline
Physics of gases, plasmas and electric discharges
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
1214740

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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